Operando Xps(操作 XP)研究综述
Operando Xps 操作 XP - This model was validated against operando XPS data from previous literature to accurately predict the outer work function shift of thin film Sm0. [1] This study provides the basis for the future development of in-operando XPS techniques for water oxidation reactions. [2]该模型已针对先前文献中的操作 XPS 数据进行了验证,以准确预测薄膜 Sm0 的外部功函数偏移。 [1] 该研究为水氧化反应的 in-operando XPS 技术的未来发展提供了基础。 [2]