Modified Colloidal(改性胶体)研究综述
Modified Colloidal 改性胶体 - Herein, normal and inverse cobalt-based spinel catalysts MxCo3–xO4 (M = Zn and Ni) with a three-dimensionally ordered macroporous (3DOM) structure were successfully fabricated through the carboxy-modified colloidal crystal templating (CMCCT) method. [1] The stability of PNIPAM brush modified colloidal silica particles was compared to asymmetric and symmetric PNIPAM brush direct force measurements in the presence of 1, 10, and 500 mM aqueous salt solution of KCl, KNO3, and KSCN between 10 and 45 °C. [2] For both modified colloidal SiO2 (MCS) and unmodified colloidal SiO2 (CS), different models of adsorption and adsorption kinetics were applied to the UV–Vis spectroscopic data to quantify binding interactions, adsorption efficiency, changes in enthalpy (ΔH), entropy (ΔS), and free energy (ΔG) of the adsorption processes. [3] A superhydrophobic coating based on silicone and surface-modified colloidal silica is explored and exploited. [4] A modified colloidal lithography technique has been used in fabrication of double-nanohole apertures achieving dimensions appropriate for trapping single molecules in this regime. [5] With CeO2-S and CeO2-SK as supports respectively, a modified colloidal deposition method was employed to obtain Pd/CeO2 catalysts for being used in lean methane combustion. [6]在此，通过羧基改性胶体晶体模板（CMCCT）方法成功制备了具有三维有序大孔（3DOM）结构的正向和反向钴基尖晶石催化剂 MxCo3–xO4（M = Zn 和 Ni）。 [1] 在 10 至 45 °C 的 1、10 和 500 mM KCl、KNO3 和 KSCN 盐水溶液存在下，将 PNIPAM 刷改性胶态二氧化硅颗粒的稳定性与不对称和对称 PNIPAM 刷直接力测量值进行了比较。 [2] 对于改性胶体 SiO2 (MCS) 和未改性胶体 SiO2 (CS)，将不同的吸附和吸附动力学模型应用于 UV-Vis 光谱数据，以量化结合相互作用、吸附效率、焓变化 (ΔH)、熵 (ΔS ）和吸附过程的自由能（ΔG）。 [3] 探索和开发了一种基于有机硅和表面改性胶体二氧化硅的超疏水涂层。 [4] 一种改进的胶体光刻技术已被用于制造双纳米孔孔径，以达到适合在该方案中捕获单个分子的尺寸。 [5] 分别以CeO2-S和CeO2-SK为载体，采用改进的胶体沉积法制备了用于贫甲烷燃烧的Pd/CeO2催化剂。 [6]
modified colloidal silica 改性胶体二氧化硅
The stability of PNIPAM brush modified colloidal silica particles was compared to asymmetric and symmetric PNIPAM brush direct force measurements in the presence of 1, 10, and 500 mM aqueous salt solution of KCl, KNO3, and KSCN between 10 and 45 °C. [1] A superhydrophobic coating based on silicone and surface-modified colloidal silica is explored and exploited. [2]在 10 至 45 °C 的 1、10 和 500 mM KCl、KNO3 和 KSCN 盐水溶液存在下，将 PNIPAM 刷改性胶态二氧化硅颗粒的稳定性与不对称和对称 PNIPAM 刷直接力测量值进行了比较。 [1] 探索和开发了一种基于有机硅和表面改性胶体二氧化硅的超疏水涂层。 [2]