Gold Nanofilms(金纳米薄膜)研究综述
Gold Nanofilms 金纳米薄膜 - The formation conditions of gold nanofilms on a silicon (Si) substrate by galvanic replacement in a dimethyl sulfoxide (DMSO) solvent and their subsequent use for the fabrication of Si nanostructures by metal-assisted chemical etching (MACE) method were under study. [1] Self-assembly of gold nanosheets at the liquid/liquid interface of the organic/water phase was introduced as a simple procedure to approach the formation of gold nanofilms. [2] PURPOSE To measure radioenhancement by gold nanoparticles (GNPs) using gold nanofilms (GNFs). [3] Terahertz electric field induced nonlinearity on gold nanofilms with different thicknesses are systematically investigated. [4]正在研究在二甲基亚砜 (DMSO) 溶剂中通过电置换在硅 (Si) 衬底上形成金纳米膜的条件,以及它们随后用于通过金属辅助化学蚀刻 (MACE) 方法制造 Si 纳米结构的条件。 [1] 引入了在有机/水相的液/液界面处自组装金纳米片作为接近金纳米膜形成的简单程序。 [2] 目的 使用金纳米薄膜 (GNF) 测量金纳米颗粒 (GNP) 的放射性增强。 [3] 系统研究了不同厚度金纳米薄膜上的太赫兹电场引起的非线性。 [4]