Alloy Nitride(氮化合金)研究综述
Alloy Nitride 氮化合金 - The precipitation behaviors of alloy nitrides during the high-temperature tempering of Fe-0. [1]Fe-0高温回火过程中合金氮化物的析出行为 [1]
Entropy Alloy Nitride 熵合金氮化物
The purpose of this paper is to explore the effect of bias voltage on plasma discharge characteristics, element concentration, microstructure, morphology, and mechanical properties of super-hard (AlCrTiVZr)N high-entropy alloy nitride (HEAN) films synthesized by high power impulse magnetron sputtering (HiPIMS). [1] The newly increasing development of abruptly high entropy alloy nitride (HEAN), especially the refractory HEAN, manifests excellent mechanical, corrosion resistance, and optical properties, which exhibits a wide application prospect in the field of coatings. [2] A feasible method of improving performance stability is the introduction of high-entropy materials, such as high-entropy alloy nitrides. [3] We demonstrate the growth of 111-oriented, stoichiometric, B1-structured high-entropy alloy nitride (VNbTaMoW)N/Al2O3(0001) thin film via reactive magnetron sputtering and determine its elastic modulus E as 187±70 GPa using in situ buckling tests. [4]本文旨在探讨偏置电压对高功率脉冲合成超硬（AlCrTiVZr）N高熵合金氮化物（HEAN）薄膜的等离子体放电特性、元素浓度、显微组织、形貌和力学性能的影响。磁控溅射（HiPIMS）。 [1] 新近发展的高熵合金氮化物（HEAN），特别是难熔材料HEAN，表现出优异的机械性能、耐腐蚀性能和光学性能，在涂料领域展现出广阔的应用前景。 [2] 提高性能稳定性的一种可行方法是引入高熵材料，例如高熵合金氮化物。 [3] 我们通过反应磁控溅射演示了 111 取向、化学计量、B1 结构的高熵合金氮化物 (VNbTaMoW)N/Al2O3(0001) 薄膜的生长，并使用原位屈曲测试确定其弹性模量 E 为 187±70 GPa . [4]