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Dioxide Thin sentence examples within pulsed laser deposition
In this paper, we report on the effect of titanium dioxide (TiO2) target sintering temperature on the morphological and optical properties of amorphous titanium dioxide thin films synthesized by pulsed laser deposition (PLD) on indium tin oxide (ITO) glass substrate and subsequently heat-treated in air at low temperature (150 °C).
In this paper, we report on the effect of titanium dioxide (TiO2) target sintering temperature on the morphological and optical properties of amorphous titanium dioxide thin films synthesized by pulsed laser deposition (PLD) on indium tin oxide (ITO) glass substrate and subsequently heat-treated in air at low temperature (150 °C).
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In this work Titanium Dioxide thin films were successfully deposited on glass substrates at room temperature by pulsed laser deposition technique (PLD) using a Q-switch Nd: YAG laser to fabricate thin films.
In this work Titanium Dioxide thin films were successfully deposited on glass substrates at room temperature by pulsed laser deposition technique (PLD) using a Q-switch Nd: YAG laser to fabricate thin films.
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Dioxide Thin sentence examples within Titanium Dioxide Thin
Titanium dioxide thin films were deposited by radio frequency sputtering on glass substrates at different substrate temperatures.
Titanium dioxide thin films were deposited by radio frequency sputtering on glass substrates at different substrate temperatures.
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Titanium dioxide thin films of mixed phase (anatase + rutile) and single phase (anatase) were prepared using different gas mixing ratios, and for both of the two phases, they were diagnosed via x-ray diffraction (XRD).
Titanium dioxide thin films of mixed phase (anatase + rutile) and single phase (anatase) were prepared using different gas mixing ratios, and for both of the two phases, they were diagnosed via x-ray diffraction (XRD).
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Dioxide Thin sentence examples within Vanadium Dioxide Thin
Comprehensive model for the insulator to metal phase transition in vanadium dioxide thin film in the presence of external electrical stimulus is proposed.
Comprehensive model for the insulator to metal phase transition in vanadium dioxide thin film in the presence of external electrical stimulus is proposed.
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A study of the voltage-controlled phase transition mechanism in vanadium dioxide thin films was performed in the temperature range 65 – 295 K.
A study of the voltage-controlled phase transition mechanism in vanadium dioxide thin films was performed in the temperature range 65 – 295 K.
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Dioxide Thin sentence examples within Tin Dioxide Thin
Dioxide Thin sentence examples within Silicon Dioxide Thin
The ability to undertake simultaneous thickness measurements of both layers using the proposed system was successfully verified on a specimen consisting of silicon dioxide thin film with nominal thicknesses of 100 nm and 150 nm and a 450 µm-thick silicon substrate, resulting in the exact separation between the two layers.
The ability to undertake simultaneous thickness measurements of both layers using the proposed system was successfully verified on a specimen consisting of silicon dioxide thin film with nominal thicknesses of 100 nm and 150 nm and a 450 µm-thick silicon substrate, resulting in the exact separation between the two layers.
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Novel optical absorbers are made using titanium metal and silicon dioxide thin films in specific layer thicknesses that create a low fractional reflectance and transmittance material.
Novel optical absorbers are made using titanium metal and silicon dioxide thin films in specific layer thicknesses that create a low fractional reflectance and transmittance material.
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Dioxide Thin sentence examples within dioxide thin film
Titanium dioxide thin films were deposited by radio frequency sputtering on glass substrates at different substrate temperatures.
Titanium dioxide thin films were deposited by radio frequency sputtering on glass substrates at different substrate temperatures.
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Titanium dioxide thin films of mixed phase (anatase + rutile) and single phase (anatase) were prepared using different gas mixing ratios, and for both of the two phases, they were diagnosed via x-ray diffraction (XRD).
Titanium dioxide thin films of mixed phase (anatase + rutile) and single phase (anatase) were prepared using different gas mixing ratios, and for both of the two phases, they were diagnosed via x-ray diffraction (XRD).
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10.4028/www.scientific.net/jnanor.70.1
Titanium dioxide thin films were deposited by radio frequency sputtering on glass substrates at different substrate temperatures.
Titanium dioxide thin films were deposited by radio frequency sputtering on glass substrates at different substrate temperatures.
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10.21203/rs.3.rs-793714/v1
Titanium dioxide thin films of mixed phase (anatase + rutile) and single phase (anatase) were prepared using different gas mixing ratios, and for both of the two phases, they were diagnosed via x-ray diffraction (XRD).
Titanium dioxide thin films of mixed phase (anatase + rutile) and single phase (anatase) were prepared using different gas mixing ratios, and for both of the two phases, they were diagnosed via x-ray diffraction (XRD).
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10.1016/J.TSF.2021.138641
This study investigates the surface modification of polyethylene terephthalate track-etched membranes by planar magnetron sputtering of titanium and titanium dioxide thin films to improve its hydrophilicity and photocatalytic activity.
This study investigates the surface modification of polyethylene terephthalate track-etched membranes by planar magnetron sputtering of titanium and titanium dioxide thin films to improve its hydrophilicity and photocatalytic activity.
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10.1002/advs.202100389
These embedded microstirrers are fabricated through the asymmetric coating of titanium dioxide thin film onto magnesium microparticles.
These embedded microstirrers are fabricated through the asymmetric coating of titanium dioxide thin film onto magnesium microparticles.
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10.3390/COATINGS11050561
In this paper, we report on the effect of titanium dioxide (TiO2) target sintering temperature on the morphological and optical properties of amorphous titanium dioxide thin films synthesized by pulsed laser deposition (PLD) on indium tin oxide (ITO) glass substrate and subsequently heat-treated in air at low temperature (150 °C).
In this paper, we report on the effect of titanium dioxide (TiO2) target sintering temperature on the morphological and optical properties of amorphous titanium dioxide thin films synthesized by pulsed laser deposition (PLD) on indium tin oxide (ITO) glass substrate and subsequently heat-treated in air at low temperature (150 °C).
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10.1364/OE.440507
The ability to undertake simultaneous thickness measurements of both layers using the proposed system was successfully verified on a specimen consisting of silicon dioxide thin film with nominal thicknesses of 100 nm and 150 nm and a 450 µm-thick silicon substrate, resulting in the exact separation between the two layers.
The ability to undertake simultaneous thickness measurements of both layers using the proposed system was successfully verified on a specimen consisting of silicon dioxide thin film with nominal thicknesses of 100 nm and 150 nm and a 450 µm-thick silicon substrate, resulting in the exact separation between the two layers.
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10.2139/ssrn.3790082
This research paper reports on spray pyrolysis deposited cerium dioxide thin films.
This research paper reports on spray pyrolysis deposited cerium dioxide thin films.
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10.1039/d1cp02716f
Polycrystalline titanium dioxide thin films are routinely used in a broad range of applications where charge carrier lifetime is essential for their performance but the effects of the fabrication method are rarely considered.
Polycrystalline titanium dioxide thin films are routinely used in a broad range of applications where charge carrier lifetime is essential for their performance but the effects of the fabrication method are rarely considered.
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10.1109/TED.2020.3043208
Comprehensive model for the insulator to metal phase transition in vanadium dioxide thin film in the presence of external electrical stimulus is proposed.
Comprehensive model for the insulator to metal phase transition in vanadium dioxide thin film in the presence of external electrical stimulus is proposed.
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10.1088/1361-6463/ac118e
A titanium target was reactively sputtered in an Ar/O2 atmosphere by (i) conventional direct current magnetron sputtering (DCMS), (ii) high-power impulse magnetron sputtering (HiPIMS), and (iii) bipolar HiPIMS (BPH) discharges for the deposition of titanium dioxide thin films without intentional heating and biasing.
A titanium target was reactively sputtered in an Ar/O2 atmosphere by (i) conventional direct current magnetron sputtering (DCMS), (ii) high-power impulse magnetron sputtering (HiPIMS), and (iii) bipolar HiPIMS (BPH) discharges for the deposition of titanium dioxide thin films without intentional heating and biasing.
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10.1364/OME.421763
Single crystalline titanium dioxide thin film in the rutile phase (r-TiO2) is exfoliated from bulk material using a He+-implantation method, and is bonded onto SiO2 substrate to form a heterostructure using Cu-Sn bonding technology.
Single crystalline titanium dioxide thin film in the rutile phase (r-TiO2) is exfoliated from bulk material using a He+-implantation method, and is bonded onto SiO2 substrate to form a heterostructure using Cu-Sn bonding technology.
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10.1016/j.chaos.2020.110503
A study of the voltage-controlled phase transition mechanism in vanadium dioxide thin films was performed in the temperature range 65 – 295 K.
A study of the voltage-controlled phase transition mechanism in vanadium dioxide thin films was performed in the temperature range 65 – 295 K.
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10.1088/2053-1591/ac2fcb
Hafnium dioxide thin films on a Mo substrate were obtained via thermal MOCVD using Hafnium(IV) acetylacetonate(Hf(acac)4) in a horizontal cold-wall reactor.
Hafnium dioxide thin films on a Mo substrate were obtained via thermal MOCVD using Hafnium(IV) acetylacetonate(Hf(acac)4) in a horizontal cold-wall reactor.
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10.1063/1.5089446
The wavelength conversion material can absorb UV region of light and emitted visible light even in the titanium dioxide thin-films.
The wavelength conversion material can absorb UV region of light and emitted visible light even in the titanium dioxide thin-films.
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10.1002/ADFM.201809013
The UV photodetectors are composed of a titanium dioxide thin film as the photosensitive layer sandwiched between two different transparent electrodes to form asymmetric Schottky junctions.
The UV photodetectors are composed of a titanium dioxide thin film as the photosensitive layer sandwiched between two different transparent electrodes to form asymmetric Schottky junctions.
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10.2478/amcs-2019-0031
Measurements of the current–voltage characteristics for titanium dioxide thin layers are also presented, and compared with the results of numerical calculations.
Measurements of the current–voltage characteristics for titanium dioxide thin layers are also presented, and compared with the results of numerical calculations.
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10.1117/12.2543154
The transmittance of titanium dioxide thin films changed with the sputtering parameters and thermal oxidation process in the range.
The transmittance of titanium dioxide thin films changed with the sputtering parameters and thermal oxidation process in the range.
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10.1109/ICAEE47123.2019.9015158
X-ray diffraction patterns indicated that tin dioxide thin films had a polycrystalline tetragonal rutile structure.
X-ray diffraction patterns indicated that tin dioxide thin films had a polycrystalline tetragonal rutile structure.
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10.1016/j.ijthermalsci.2019.106061
We present a comparative study of the emission properties of a vanadium dioxide thin film (approximately 200 nm) deposited on a silicon wafer in different sub-spectral-ranges of the mid-infrared, with particular attention to the windows of transparency of the atmosphere to the infrared radiation (i.
We present a comparative study of the emission properties of a vanadium dioxide thin film (approximately 200 nm) deposited on a silicon wafer in different sub-spectral-ranges of the mid-infrared, with particular attention to the windows of transparency of the atmosphere to the infrared radiation (i.
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10.3934/MATERSCI.2019.2.276
Tin dioxide thin films are obtained by spray pyrolysis technique on glass substrates.
Tin dioxide thin films are obtained by spray pyrolysis technique on glass substrates.
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10.1063/1.5090660
However, currently the manufacturing technology of titanium dioxide thin film is still immature.
However, currently the manufacturing technology of titanium dioxide thin film is still immature.
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10.1016/J.SPMI.2019.01.032
The nanobranch (Nb) and dense-forest (DF) structured tin dioxide thin films were prepared by hot wall nebulizer spray pyrolysis technique for different precursor concentrations.
The nanobranch (Nb) and dense-forest (DF) structured tin dioxide thin films were prepared by hot wall nebulizer spray pyrolysis technique for different precursor concentrations.
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10.1117/12.2535817
Third-order nonlinear optical effects exhibited by Gold-Platinum nanoparticles in a Titanium Dioxide thin solid film were induced by a two-wave mixing configuration with digitally-modulated irradiance profiles.
Third-order nonlinear optical effects exhibited by Gold-Platinum nanoparticles in a Titanium Dioxide thin solid film were induced by a two-wave mixing configuration with digitally-modulated irradiance profiles.
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10.1016/J.APSUSC.2018.04.177
This work presents a study of the structural and optical properties of cobalt-doped titanium dioxide thin films prepared via the DC Magnetron Co-Sputtering technique using TiO2 and Co targets with 99.
This work presents a study of the structural and optical properties of cobalt-doped titanium dioxide thin films prepared via the DC Magnetron Co-Sputtering technique using TiO2 and Co targets with 99.
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10.1117/12.2541118
Novel optical absorbers are made using titanium metal and silicon dioxide thin films in specific layer thicknesses that create a low fractional reflectance and transmittance material.
Novel optical absorbers are made using titanium metal and silicon dioxide thin films in specific layer thicknesses that create a low fractional reflectance and transmittance material.
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10.11648/J.AJPST.20190502.11
In this work Titanium Dioxide thin films were successfully deposited on glass substrates at room temperature by pulsed laser deposition technique (PLD) using a Q-switch Nd: YAG laser to fabricate thin films.
In this work Titanium Dioxide thin films were successfully deposited on glass substrates at room temperature by pulsed laser deposition technique (PLD) using a Q-switch Nd: YAG laser to fabricate thin films.
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10.35873/ajmahs.2019.9.8.075
The X-ray diffraction pattern of the niobium-titanium dioxide thin film sintered at 600°C oxygen atmosphere showed a niobium peak, indicating that titanium oxide and niobium reacted at a high temperature above 450°C.
The X-ray diffraction pattern of the niobium-titanium dioxide thin film sintered at 600°C oxygen atmosphere showed a niobium peak, indicating that titanium oxide and niobium reacted at a high temperature above 450°C.
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10.1063/1.5132720
The paper is devoted to the study of the evaporation of water sessile drops resting on a smooth surface consisting of a vanadium dioxide thin film (∼150 nm) covering a sapphire substrate.
The paper is devoted to the study of the evaporation of water sessile drops resting on a smooth surface consisting of a vanadium dioxide thin film (∼150 nm) covering a sapphire substrate.
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10.1364/OL.44.002752
Here we present a study on dynamically tunable bowtie nanoantennas integrated on a vanadium dioxide thin film with a thermal phase transition.
Here we present a study on dynamically tunable bowtie nanoantennas integrated on a vanadium dioxide thin film with a thermal phase transition.
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10.18321/ECTJ781
Tin dioxide thin films were obtained by centrifuging.
Tin dioxide thin films were obtained by centrifuging.
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10.1109/DTIP.2019.8752869
This paper presents the analysis of temperature effect on the mechanical properties of titanium dioxide thin films.
This paper presents the analysis of temperature effect on the mechanical properties of titanium dioxide thin films.
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10.1016/J.SNB.2018.09.082
After validating this method, we developed our sensors based on tin dioxide thin sensitive layers with thickness of 50 nm.
After validating this method, we developed our sensors based on tin dioxide thin sensitive layers with thickness of 50 nm.
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10.1051/EPJPV/2019006
An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films.
An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films.
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10.1016/J.CERAMINT.2019.06.153
The electronic structure of the tin dioxide thin films that were prepared at several substrate temperatures were investigated with the collected X-ray Absorption Spectroscopy (XAS) data.
The electronic structure of the tin dioxide thin films that were prepared at several substrate temperatures were investigated with the collected X-ray Absorption Spectroscopy (XAS) data.
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10.1016/J.SUSC.2018.10.015
An ultra-high-vacuum-compatible direct current ion beam sputter source is used to deposit strongly defective zirconium dioxide thin films by operation in high vacuum with different oxygen and hydrogen partial pressures.
An ultra-high-vacuum-compatible direct current ion beam sputter source is used to deposit strongly defective zirconium dioxide thin films by operation in high vacuum with different oxygen and hydrogen partial pressures.
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10.1016/J.VACUUM.2018.10.029
Titanium dioxide thin films were deposited by RF Sputtering technique on Silicon (100) and ITO substrates followed by annealing at 500 °C for 6 h.
Titanium dioxide thin films were deposited by RF Sputtering technique on Silicon (100) and ITO substrates followed by annealing at 500 °C for 6 h.
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10.1016/j.tsf.2019.137592
In this work the structural properties and photoluminescence of tellurium dioxide thin films doped by europium were described.
In this work the structural properties and photoluminescence of tellurium dioxide thin films doped by europium were described.
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10.1007/s40012-019-00226-x
Finally, EM modeling of optical switching devices—consisting of a plasmonic nanostructure system consisting of an array of gold nanowires separated from an underlying gold film by a vanadium dioxide thin film spacer layer—is discussed.
Finally, EM modeling of optical switching devices—consisting of a plasmonic nanostructure system consisting of an array of gold nanowires separated from an underlying gold film by a vanadium dioxide thin film spacer layer—is discussed.
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10.1016/J.TSF.2019.05.021
Vanadium dioxide thin films have been prepared on lightly doped silicon substrates via the electron beam evaporation of pure vanadium and subsequent furnace oxidation in an oxygen environment at 300 °C.
Vanadium dioxide thin films have been prepared on lightly doped silicon substrates via the electron beam evaporation of pure vanadium and subsequent furnace oxidation in an oxygen environment at 300 °C.
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10.11648/J.AJPST.20190501.14
In this work Titanium Dioxide thin films were fabricated by pulsed laser deposition technique (PLD) using a Q-switched Nd: YAG laser.
In this work Titanium Dioxide thin films were fabricated by pulsed laser deposition technique (PLD) using a Q-switched Nd: YAG laser.
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10.30799/JTFR.019.19030101
Article history: Received 22 April 2019 Accepted 27 May 2019 Available online 12 June 2019 This work reports on the influence of niobium on the structural and optical properties of titanium dioxide thin films made by DC Magnetron sputtering.
Article history: Received 22 April 2019 Accepted 27 May 2019 Available online 12 June 2019 This work reports on the influence of niobium on the structural and optical properties of titanium dioxide thin films made by DC Magnetron sputtering.
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10.1117/12.2539200
In this paper, a new type of hot pressing process is introduced to fabricate silicon dioxide thin films based on PET.
In this paper, a new type of hot pressing process is introduced to fabricate silicon dioxide thin films based on PET.
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10.1016/J.MATERRESBULL.2019.110585
Er-doped tin dioxide thin films, deposited on glass substrates by a combination of sol-gel and resistive evaporation techniques, are investigated.
Er-doped tin dioxide thin films, deposited on glass substrates by a combination of sol-gel and resistive evaporation techniques, are investigated.
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10.1039/c9nr09024j
A detailed structural investigation of the semiconductor-to-metal transition (SMT) in vanadium dioxide thin films deposited on sapphire substrates by pulsed laser deposition was performed by in situ temperature-dependent X-ray diffraction (XRD) measurements.
A detailed structural investigation of the semiconductor-to-metal transition (SMT) in vanadium dioxide thin films deposited on sapphire substrates by pulsed laser deposition was performed by in situ temperature-dependent X-ray diffraction (XRD) measurements.
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10.1134/S1063782619160036
Titanium dioxide thin film was deposited on a silicon substrate using DC magnetron technique.
Titanium dioxide thin film was deposited on a silicon substrate using DC magnetron technique.
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10.1007/s10854-019-01031-7
Titanium dioxide thin film was coated on p-type porous silicon by sol–gel spin coating method.
Titanium dioxide thin film was coated on p-type porous silicon by sol–gel spin coating method.
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10.1007/s11172-019-2542-z
The possible application of these dyes as sensitizers of mesoporous titanium dioxide thin films in dye-sensitized solar cells (DSSC) was shown.
The possible application of these dyes as sensitizers of mesoporous titanium dioxide thin films in dye-sensitized solar cells (DSSC) was shown.
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10.3390/coatings9100625
This work aims at the identification of porous titanium dioxide thin film (photo)electrodes that represent suitable host structures for a subsequent electrodeposition of plasmonic nanoparticles.
This work aims at the identification of porous titanium dioxide thin film (photo)electrodes that represent suitable host structures for a subsequent electrodeposition of plasmonic nanoparticles.
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Keywords related to Dioxide
Dioxide Graphene Oxide
Dioxide Nanotubes
Dioxide Photocatalyst
Dioxide Values
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Dioxide Interaction
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Dioxide Batteries
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Dioxide Concentrations
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Dioxide Nanomaterials
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Dioxide Film
Dioxide Tension
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Dioxide Method
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Dioxide Drying
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Dioxide Removal
Dioxide Carbon
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Cts Thin
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Cellulose Thin
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Ta Thin
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