Introduction to Microsphere Photolithography

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10.1109/ACCESS.2021.3059439

Microsphere Photolithography (MPL) is a nanopatterning technique that utilizes a self-assembled monolayer of microspheres as an optical element to focus incident radiation inside a layer of photoresist.

Microsphere Photolithography Patterned Nanohole Array on an Optical Fiber

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10.1364/AO.427705

A direct-write configuration of microsphere photolithography (MPL) is investigated for the patterning of IR metasurfaces at large scales.

Direct-write microsphere photolithography of hierarchical infrared metasurfaces.

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10.1039/d1ra02652f

Off-axis microsphere photolithography (MPL) was used as a method to create a plasmonic fiber-based sensor for glucose sensing.

Off-axis microsphere photolithography patterned nanohole array and other structures on an optical fiber tip for glucose sensing

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10.1109/TRANSDUCERS.2019.8808390

The Microsphere Photolithography (MPL) technique was used to pattern nanoholes in a thin aluminum film to create Extraordinary Optical Transmission (EOT) based sensors on the cleaved tip of SMF-28 optical fibers.

Functional Plasmonic Fiber-Optic Based Sensors Using Low-Cost Microsphere Photolithography

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10.1117/12.2519263

This paper studies the use of Microsphere Photolithography (MPL) as an alternative to Focused Ion Beam milling or e-beam lithography to pattern plasmonic fiber-optic based sensors.

Low-cost fabrication of functional plasmonic fiber-optic-based sensors using microsphere photolithography

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10.1109/RAPID.2019.8864312

Microsphere Photolithography uses a self-assembled hexagonal lattice of microspheres as an optical element to focus collimated light to an array of photonic jets inside a layer of photoresist.

Microsphere Photolithography Patterning of Plasmonic Sensors on Optical Fiber

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Microsphere Photolithography
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What is/are Microsphere Photolithography?

Microsphere Photolithography - Microsphere Photolithography (MPL) is a nanopatterning technique that utilizes a self-assembled monolayer of microspheres as an optical element to focus incident radiation inside a layer of photoresist. [1] A direct-write configuration of microsphere photolithography (MPL) is investigated for the patterning of IR metasurfaces at large scales. [2] Off-axis microsphere photolithography (MPL) was used as a method to create a plasmonic fiber-based sensor for glucose sensing. [3] The Microsphere Photolithography (MPL) technique was used to pattern nanoholes in a thin aluminum film to create Extraordinary Optical Transmission (EOT) based sensors on the cleaved tip of SMF-28 optical fibers. [4] This paper studies the use of Microsphere Photolithography (MPL) as an alternative to Focused Ion Beam milling or e-beam lithography to pattern plasmonic fiber-optic based sensors. [5] Microsphere Photolithography uses a self-assembled hexagonal lattice of microspheres as an optical element to focus collimated light to an array of photonic jets inside a layer of photoresist. [6]